High-precision silicon-based masks are used for the study of electrical and optoelectronic properties of two-dimensional materials by etching with high precision on a silicon substrate, a method commonly used in micro-nano processing. YW MEMS prepare metal electrodes by covering the surface of thin film material with a highly accurate silicon-based mask plate and exposing the electrode pattern for partial metal deposition.

Researchers studying the electrical and optoelectronic properties of two-dimensional materials generally use silicon-based mask plates to prepare high-precision metal electrodes for two-dimensional materials.

Minimum line width 2um

Non-openwork patterned parts up to 200um

Openwork pattern section up to 20um