Vacuum coating is the deposition of a metal or non-metal in the form of a vapor phase onto the surface of a material in a vacuum environment to form a dense thin film. The quality of the coating is critical to the functional formation of the semiconductor device.

Metal and ITO materials are mainly used for the preparation of electrodes, while other non-metallic materials are mainly used for the preparation of insulating dielectric layers and sacrificial mask layers.

Mastering Coating Technology.

Electron beam evaporation, magnetron sputtering, LPCVD, PECVD, ALD atomic layer deposition coating.

Magnetron sputtering: Ti, Al, Ni, Au, Ag, Cr, Pt, Cu, TiW90, Pd, Zn, Mo, W, Ta, Nb, etc

Electron beam evaporation: Ti, Al, Ni, Au, AuGe, Cr, Pt, In, Sn, etc

Chemical deposition: SiO2, SiNx, a-Si

Silicon wafers, quartz glass wafers, sapphire wafers, PET, Pi, etc.